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Stack Membrane Electrodeionization EDI System for Semiconductor Grade Ultrapure

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Stack Membrane Electrodeionization EDI System for Semiconductor Grade Ultrapure

Operatingtemperaturerange : Typically 5°C to 45°C

Function : Continuous removal of ionized and ionizable species from water

Operatingvoltage : Typically 10-30 volts

Price : Price on request

Feedwaterquality : Pre-treated water with low hardness and organics

Productname : Electrodeionization (EDI) System

Maintenancerequirement : Low maintenance, periodic resin replacement recommended

Flowrate : Varies by model, commonly from 1 to 100 m³/h

Brand Name : QITONG

Packaging Details : container

Payment Terms : L/C,T/T,D/P

Recoveryrate : Up to 95% water recovery

Pressurerange : 0.1 to 0.6 MPa

Regeneration : Chemical-free continuous regeneration using electrical current

Technology : Combination of ion exchange resins and ion-selective membranes with electrical current

Puritylevel : Produces ultrapure water with resistivity up to 18.2 MΩ·cm

Systemdimensions : Varies by capacity, typically modular design for scalability

Delivery Time : one month

Place of Origin : China shannxi xian

MOQ : 1

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High Resistivity Stack EDI System For Semiconductor Ultrapure Water Production
Product Overview
The High Resistivity Stack EDI System is a professional high-end electrodeionization water purification equipment specifically developed for semiconductor manufacturing, electronic precision processing, optoelectronic industries, and high-standard industrial ultrapure water projects. Unlike conventional industrial EDI equipment, this stacked EDI unit focuses on ultra-high resistivity water output and ultra-trace impurity removal, perfectly matching the strict water quality requirements for wafer etching, chip cleaning, circuit board production, and precision electronic processing.
Conventional water treatment equipment cannot effectively remove trace silica, boron, and ultra-low concentration ions, which can easily cause defects in electronic products. By adopting an upgraded stacked membrane stack structure and high-precision electric desalination technology, this system achieves deep and stable purification without chemical regeneration. It can steadily supply 18.2 MΩ·cm high-resistivity ultrapure water for extended periods, making it the core supporting equipment for high-end electronic industrial water treatment systems.
Working Principle
Qualified two-stage RO pretreated water enters the high-density stacked EDI membrane stack uniformly. Under the action of a stable and precise DC electric field, the high-purity internal ion exchange resin rapidly adsorbs residual trace anions, cations, silica, and tiny organic impurities in the water. Through the selective permeation effect of ion exchange membranes, impurity ions migrate directionally and are concentrated into the concentrated water channel for automatic discharge.
The resin completes continuous electric regeneration during operation without acid and alkali chemical dosing, avoiding chemical residue and secondary water pollution. Equipped with industrial high-precision online resistivity monitoring and PLC intelligent linkage systems, the equipment automatically adjusts operating voltage, current, and water flow according to inlet water changes. This maintains zero fluctuation of outlet water quality and enables 24-hour continuous and stable supply of semiconductor-grade ultrapure water.
Core Advantages
  • Ultra-High Resistivity Stable Output: Upgraded high-density stacked membrane stack effectively removes ultra-trace ions, silica, and TOC, stably maintaining 15-18.2 MΩ·cm high resistivity water quality, fully compliant with semiconductor industrial standards.
  • Stacked High-Efficiency Structure: Compact layered stacked design features large water yield per unit area, high desalination efficiency, and small footprint, convenient for integrated installation and system matching in electronic workshops.
  • 100% Chemical-Free Operation: Automatic electric resin regeneration throughout the entire process, no acid and alkali consumption, no chemical waste discharge, zero pollution, meeting clean production requirements of high-tech factories.
  • Ultra-Low Impurity Removal Capacity: Effectively removes trace boron, silica, and micro-particles that cannot be completely filtered by ordinary EDI equipment, ensuring high cleanliness of process water for precision electronics production.
  • Intelligent Constant Water Quality Control: Real-time online monitoring of water resistivity and automatic parameter calibration, no water quality attenuation after long-term full-load operation, ensuring consistent production water standards.
  • Industrial Durable & Low Maintenance: High-strength anti-aging membrane stack and industrial anti-corrosion structure, low failure rate, long service life, significantly reducing long-term operation and maintenance costs.
Technical Parameters
Applicable Scenarios Semiconductor wafer production, chip manufacturing, PCB production, optoelectronic panel industry, precision electronic processing, high-end industrial ultrapure water projects
Customizable Water Flow 0.5-50 m³/h
Supporting Pretreatment Two-stage RO reverse osmosis system
Outlet Water Resistivity 15-18.2 MΩ·cm (stable continuous output)
Ultimate Desalination Rate ≥99.8%
TOC Removal Rate High-efficiency removal of trace organic carbon
Operation Mode 24-hour full-automatic unattended continuous operation
Core Structure High-density stacked EDI membrane stack
Control System PLC intelligent linkage + online water quality real-time monitoring
Application Scenarios
  • Semiconductor wafer and chip manufacturing ultrapure water supply
  • Precision etching, cleaning and coating process water for electronic components
  • LCD, OLED photoelectric panel and solar cell production water treatment
  • PCB circuit board industrial high-purity water preparation
  • High-tech industrial park standardized ultrapure water system construction and upgrading
Packaging & After-sales Service
Export-standard fumigated wooden case packaging with complete installation drawings, wiring diagrams, and professional operation manuals. Core stacked EDI membrane stacks, precision sensors, and intelligent control systems enjoy 1-year warranty. We provide personalized customized flow and system matching solutions according to different electronic production line standards, supporting long-term remote technical support and global after-sales service.

Product Tags:

Stack Membrane Electrodeionization EDI System

      

Semiconductor Grade Ultrapure Equipment

      

High Resistivity Water Purification System

      
Quality Stack Membrane Electrodeionization EDI System for Semiconductor Grade Ultrapure for sale

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